发明名称 PLATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a plating method that can suppress generation of sludge and can efficiently supply an Sn component.SOLUTION: A target substrate 2 and an insoluble anode electrode 3 are placed in a plating tank 1 that stores an Sn-containing plating solution. The target substrate 2 is plated, and at the same time, the plating solution is drawn from the tank and then mixed with metal tin powder to produce a mixed plating solution, which is supplied to the insoluble anode electrode 3. Oxygen generated from the insoluble anode electrode 3 is brought into contact with the metal tin powder to produce Sn ions.
申请公布号 JP2014031533(A) 申请公布日期 2014.02.20
申请号 JP20120171361 申请日期 2012.08.01
申请人 MITSUBISHI MATERIALS CORP 发明人 KATASE TAKUMA;MASUDA AKIHIRO
分类号 C25D21/14;C25D17/00;C25D17/10 主分类号 C25D21/14
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