| 摘要 |
In a method for manufacturing a target for X-ray emission, a bottomed hole is formed in a substrate (S102). In the method for manufacturing a target for X-ray emission, subsequently, the position where an ion beam is irradiated is aligned with the diametric center of the hole (S103). In the method for manufacturing a target for X-ray emission, subsequently, the irradiation position of the ion beam is fixed, and the ion beam is intermittently irradiated while a stream of a material gas for the target for X-ray emission is directed at the location where the ion beam is irradiated (S104). A period of time over which ion irradiation is turned off is provided, whereby the material gas flows to the bottom of the hole; therefore, metal can be deposited from the bottom of the hole, enabling voids to be prevented from forming in the bottom of the hole. |
