发明名称 |
APPARATUS AND METHOD FOR ATOMIC LAYER DEPOSITION |
摘要 |
Apparatus for atomic layer deposition on a surface of a sheeted substrate, comprising: an injector head comprising a deposition space provided with a precursor supply and a precursor drain; said supply and drain arranged for providing a precursor gas flow from the precursor supply via the deposition space to the precursor drain; the deposition space in use being bounded by the injector head and the substrate surface; a gas bearing comprising a bearing gas injector, arranged for injecting a bearing gas between the injector head and the substrate surface, the bearing gas thus forming a gas-bearing; a conveying system providing relative movement of the substrate and the injector head along a plane of the substrate to form a conveying plane along which the substrate is conveyed. A support part arranged opposite the injector head, the support part constructed to provide a gas bearing pressure arrangement that balances the injector head gas-bearing in the conveying plane, so that the substrate is held supportless by said gas bearing pressure arrangement in between the injector head and the support part. |
申请公布号 |
KR20140020887(A) |
申请公布日期 |
2014.02.19 |
申请号 |
KR20137022769 |
申请日期 |
2012.01.31 |
申请人 |
NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO |
发明人 |
VERMEER ADRIANUS JOHANNES PETRUS MARIA;WIT ROBERT COENRAAD;GORTZEN ROGER M.W. |
分类号 |
C23C16/458;B65G51/03;C23C16/455;C23C16/54 |
主分类号 |
C23C16/458 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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