| 摘要 |
The present invention relates to a multiple line-laser annealing apparatus. The objective of the present invention is to obtain multiple line-laser light uniformly distributed all over and enable base materials having different local annealing conditions to be treated at the same time, to thus improve the productivity of an annealing process. To this end, the multiple line-laser annealing apparatus according to the present invention comprises: at least one primary light source unit; at least one secondary light source unit for convert the laser beam generated by the primary light source unit into multiple linear lasers; and a base plate for fixing an annealing base material such that the annealing base material can be annealed by the multiple lasers emitted by the secondary light source unit. Thus, the multiple line-laser annealing apparatus of the present invention is advantageous in that it can enable high optical efficiency and light of multiple lines that are uniformly distributed all over to be obtained, and base materials having different local annealing conditions to be treated at the same time, to thus improve the productivity of an annealing process. |
