| 摘要 |
A deposition apparatus comprises: a process chamber; a crucible; a disk; a rotatory unit; a deposition-preventing plate; and a measuring sensor. The process chamber has a monitoring window on a part of the upper wall thereof. The disk is arranged in between the monitoring window and the crucible; is overlapped with the monitoring window in a first direction; and rotates around the first direction. The disposition-preventing plate is arranged in between the disk and the crucible; and is provided with an opening overlapped with the monitoring window in the first direction. The measuring sensor is overlapped with the monitoring sensor, the disk, the opening and the crucible in the first direction; and measures the residual quantity of a deposition material inside the crucible. |
