| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a single-particle film etching mask on a curved surface closely two-dimensionally packed with and highly precisely disposed with respective particles constituting a single-particle film; to provide a manufacturing method of the same; to provide a manufacturing method of a microstructure on the curved surface using the single-particle film etching mask; and to provide a highly precise microstructure on the curved surface acquired by the manufacturing method. <P>SOLUTION: The single-particle film is formed on a substrate whose one part or whole part is formed of a surface having a surface-directional pitch or size of 0.1 μm-10000 μm at a non-planar surface such as a curved face, an inclined surface and a step, the single-particle film being closely two-dimensionally packed with the particles. In the single-particle film, a displacement D (%) of a particle array defined by the following expression (1) is 10% or less. D(%)=¾B-A¾×100/A...(1) (In the expression (1), A represents an average particle diameter of the particle, and B represents an average pitch between the particles in the single-particle film). <P>COPYRIGHT: (C)2012,JPO&INPIT |
