PHOTORESIST COMPOSITION AND METHOD OF FORMING A COLOR FILTER USING THE SAME

摘要

Disclosed photoresist composition includes 5-10% wt% of a binder resin, 5-10% wt% of a photopolymerizable monomer, 1-5% wt% of a photopolymerization initiator activated by light with 400-410 nm wavelengths, 5-10% wt% of a black colorant, and a residual solvent. Therefore, the optical properties of the photoresist composition against an exposure device using light with h-line wavelengths can be improved.