| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid processing apparatus and a liquid processing method which prevent fumes adhered to a top plate during SPM processing from adhering to a substrate in other processes, such as dry process, which are conducted after the SPM processing. SOLUTION: A top plate 32 moves in a horizontal direction between an advanced position where the top plate 32 covers a substrate W held by a substrate holding part 21 from above and a retreated position where the top plate 32 has been retreated from the advanced position in the horizontal direction. An air hood 70 for flowing a cleaned gas downward moves up and down between a lowered position where the air hood 70 covers the substrate W held by the substrate holding part 21 from above and a rise position located higher than the lowered position. COPYRIGHT: (C)2013,JPO&INPIT |
