发明名称 |
Mass flow controller, mass flow controller system, substrate processing device, and gas flow rate adjusting method |
摘要 |
According to one embodiment, a flow rate adjusting unit is disposed on a gas passageway and includes a valve that adjusts the flow rate of a gas and an actuator that controls the displacement amount of the valve. A displacement amount storage unit stores displacement amount information in which a displacement amount of the valve, used when a gas flows into the gas passageway at a flow rate defined according to a process procedure before performing the process procedure, is obtained in advance for each process procedure. A setting circuit acquires the displacement amount corresponding to the process procedure from the displacement amount storage unit, and controls the actuator on the basis of the acquired displacement amount. |
申请公布号 |
US8651135(B2) |
申请公布日期 |
2014.02.18 |
申请号 |
US201113173409 |
申请日期 |
2011.06.30 |
申请人 |
ETO HIDEO;SAITO MAKOTO;NISHIYAMA NOBUYASU;KABUSHIKI KAISHA TOSHIBA |
发明人 |
ETO HIDEO;SAITO MAKOTO;NISHIYAMA NOBUYASU |
分类号 |
F16K31/02 |
主分类号 |
F16K31/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|