发明名称 Nonvolatile memory device including a channel pad having a channel extending portion and a spacer and method of manufacturing the same
摘要 A nonvolatile memory device having a vertical structure and a method of manufacturing the same, the nonvolatile memory device including a channel region that vertically extends from a substrate; gate electrodes on the substrate, the gate electrodes being disposed along an outer side wall of the channel region and spaced apart from one another; and a channel pad that extends from one side of the channel region to an outside of the channel region, the channel pad covering a top surface of the channel region.
申请公布号 US8653585(B2) 申请公布日期 2014.02.18
申请号 US201213404047 申请日期 2012.02.24
申请人 YOUM EUN-SUN;PARK SANG-YONG;PARK JIN-TAEK;KIM YONG-TOP;SAMSUNG ELECTRONICS CO., LTD. 发明人 YOUM EUN-SUN;PARK SANG-YONG;PARK JIN-TAEK;KIM YONG-TOP
分类号 H01L29/66 主分类号 H01L29/66
代理机构 代理人
主权项
地址