发明名称 |
Pattern inspection method, pattern inspection program, and electronic device inspection system |
摘要 |
It is an object of the present invention to provide a technique capable of accurately inspecting a circuit pattern in which the contrast of an observation image is not clear, like a circuit pattern having a multilayer structure. A pattern inspection method according to the present invention divides a circuit pattern using the brightness of a reflection electron image and associates the region in the reflection electron image belonging to each division with the region in a secondary electron image. |
申请公布号 |
US8653456(B2) |
申请公布日期 |
2014.02.18 |
申请号 |
US201113577568 |
申请日期 |
2011.02.09 |
申请人 |
TOYODA YASUTAKA;FUNAKOSHI TOMOHIRO;HIRAI TAKEHIRO;HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
TOYODA YASUTAKA;FUNAKOSHI TOMOHIRO;HIRAI TAKEHIRO |
分类号 |
G01N23/00;G21K7/00 |
主分类号 |
G01N23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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