SUBSTRATE CLEANING DEVICE, SUBSTRATE CLEANING SYSTEM, SUBSTRATE CLEANING METHOD AND STORAGE MEDIUM

摘要

The present invention is to remove particles attached to a substrate while preventing the erosion of an underlayer or pattern damage. According to the embodiment, a substrate cleaning device comprises a first solution supply part and a second solution supply part. The first solution supply part supplies a process solution for forming a layer on the substrate and including a volatile component to the substrate. The second solution supply part supplies a removal solution for removing all process solution including a solidified or a harden process solution supplied by the first solution supply part from the substrate. [Reference numerals] (9) Decompression device