| 摘要 |
Disclosed is a cleaning gas for deposits, which contains CHF 2 COF. The cleaning gas may contain O 2 , O 3 , CO, CO 2 , F 2 , NF 3 , Cl 2 , Br 2 , I 2 , XF n (In this formula, X represents Cl, I or Br. n represents an integer satisfying 1‰¤n‰¤7.), CH 4 , CH 3 F, CH 2 F 2 , CHF 3 , N 2 , He, Ar, Ne, Kr and the like, and can be applied to deposits that include W, Ti, Mo, Re, Ge, P, Si, V, Nb, Ta, Se, Te, Mo, Re, Os, Ir, Sb, Ge, Au, Ag, As, Cr, their compounds, and the like. This cleaning gas is not only excellent in cleaning performances but also easily available and does not substantially by-produce CF 4 that places a burden on the environment. |
