摘要 |
PURPOSE: An apparatus for cleaning a gas supplying unit is provided to reduce process time by automatizing a cleaning process. CONSTITUTION: A first cleaner includes a brush. The brush removes a foreign substance from a gas spraying unit. A second cleaner wipes the foreign substance remaining on the gas spraying unit. A guide rail (800) is positioned on the outside of the gas spraying unit. A driving part (700) operates a case on the guide rail. |