| 摘要 |
Disclosed is a photosensitive resin composition which can form a highly precise pattern, has excellent thermal degradability of an organic component, and shows less shrinking after firing. The composition comprises an alkali-soluble resin (A) having at least one SH group, a polyfunctional (meth)acrylate (B), a photopolymerization initiator (C) and an inorganic particle (D). Also disclosed is a method for forming a pattern by using the composition. |
