| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with good DOF (depth of focus, focus margin) can be produced.SOLUTION: The resist composition comprises a resin including a structural unit having an acid-labile group, an acid generator expressed by formula (I), and an acid generator expressed by formula (II). In the formulae, Xrepresents an alkanediyl group optionally having a substituent; Rrepresents a hydrocarbon group optionally having a substituent; Rand Reach represent a fluorine atom or a perfluoroalkyl group; Lrepresents a single bond, an alkanediyl group, or the like; Yrepresents an alicyclic hydrocarbon group optionally having a substituent; Rto Reach represent a hydrogen atom, a hydroxy group, an alkyl group, or the like, in which a methylene group included in a ring including a sulfonyl cation may be replaced by an oxygen atom or a carbonyl group; r represents an integer of 1 to 3; and s represents an integer of 0 to 3. |
