| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with excellent pattern collapse resistance can be produced.SOLUTION: The resist composition comprises a resin including a structural unit having an acid labile group, an acid generator expressed by formula (I), and an acid generator expressed by formula (II). In the formulae, Rand Reach represent a hydrocarbon group, an alkoxy group, or the like; m and n each represent an integer of 0 to 4; Arepresents an organic anion; Xrepresents an alkanediyl group optionally having a substituent, in which a methylene group constituting the alkanediyl group may be replaced by an oxygen atom or a carbonyl group; Rrepresents a hydrocarbon group optionally having a substituent, in which a methylene group included in the hydrocarbon group may be replaced by an oxygen atom or a carbonyl group; and Zrepresents an organic cation. |
