| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus that enables a vaporization source to reciprocate between two deposition regions and to linearly reciprocate in each deposition region without using a guide member such as a linear guide in a vapor deposition chamber.SOLUTION: A vapor deposition apparatus has a linear vaporization source 5 in a vapor deposition chamber 4 in which a first vapor deposition region 2 for vapor deposition of a substrate and a second vapor deposition region 3 for vapor deposition of another substrate are located side by side, wherein the linear vaporization source 5 is horizontally movable parallel to the vapor deposition surface of the substrate in the first vapor deposition region 2 or the other substrate in the second vapor deposition region 3. A plurality of link mechanisms formed by rotatably connecting a plurality of links 6 are installed in the vapor deposition chamber 4, wherein a plurality of the link mechanisms support the linear vaporization source 5 horizontally movably. Each link mechanism is provided with its own drive mechanism. |
