| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with an excellent shape can be produced.SOLUTION: The resist composition comprises a resin including a structural unit having an acid-labile group, an acid generator expressed by formula (I), and an acid generator expressed by formula (II). In the formulae, Xrepresents an alkanediyl group; Rrepresents a hydrocarbon group; Zand Z1represent an organic cation; Qand Qeach represent a fluorine atom or a perfluoroalkyl group; Lrepresents a divalent saturated hydrocarbon group; ring W represents an alicyclic hydrocarbon ring; Rand Reach represent a fluorine atom or a fluorinated alkyl group; and s represents an integer of 1 to 10. |
