发明名称 |
Methods of Providing Photolithography Patterns Using Feature Parameters, Systems and Computer Program Products Implementing the Same |
摘要 |
A method of providing a photolithography pattern can be provided by identifying at least one weak feature from among a plurality of features included in a photolithography pattern based on a feature parameter that is compared to a predetermined identification threshold value for the feature parameter. A first region of the weak feature can be classified as a first dosage region and a second region of the weak feature can be classified as a second dosage region. Related methods and apparatus are also disclosed. |
申请公布号 |
US2014045334(A1) |
申请公布日期 |
2014.02.13 |
申请号 |
US201313950708 |
申请日期 |
2013.07.25 |
申请人 |
CHOI JIN;OH HEUNG-SUK;PARK SIN-JEUNG;YI RAE-WON |
发明人 |
CHOI JIN;OH HEUNG-SUK;PARK SIN-JEUNG;YI RAE-WON |
分类号 |
H01L21/308;G06F17/50 |
主分类号 |
H01L21/308 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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