APPARATUS AND METHOD FOR MANUFACTURING PHASE-TYPE DIFFRACTION ELEMENT USING LASER EXPOSURE TYPE

摘要

The present invention relates to an apparatus for manufacturing a phase-type diffraction element using a direct laser exposure method, a method of manufacturing a phase-type diffraction element, and a phase-type diffraction element using a direct laser exposure method. More specifically, the present invention relates to an apparatus and method for manufacturing a phase-type diffraction element by radiating a laser beam on a substrate formed of photo-curable resin.