| 摘要 |
The present invention relates to a heater structure of a susceptor for a chemical vapor deposition equipment comprising: a plate shape body (12) of an aluminum material having a heater buried groove (14) in the bottom; a heater (16) of a sheath heater shape, which is sealed and fixed by using a heater sealing cap (26) and a welding cap (28) by being buried in the heater buried groove; a shaft (20) and a shaft upper body structure (18) of an aluminum material which is fixed and combined to the center of an upper part of the plate shape body in order to extend a drawing part of the heater, which is focused on the center of the plate shape body; a plate (22) inside the shaft upper body structure, which is formed inside the shaft upper body structure integrally, and in which a lead hole (24), which draws the heater, is formed; and an aluminum tube (30) which is coated closely to an outer cover of the heater, which is the sheath heater form, by using a drawing process. The heater is drawn out through the lead hole, which is formed in the plate of the shaft upper body structure, and the aluminum plate and the aluminum tube of the heater are welded around the lead hole. |
