发明名称 |
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN |
摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with excellent line edge roughness can be produced.SOLUTION: The resist composition comprises a resin having a structural unit expressed by formula (I) and an acid generator expressed by formula (II). In the formulae, Xrepresents an alkanediyl group which may be substituted with a hydroxy group or the like and in which a methylene group constituting the alkanediyl group may be replaced by an oxygen atom or carbonyl group; and Rrepresents a hydrocarbon group which may be substituted with a fluorine atom or a hydroxy group and in which a methylene group included in the hydrocarbon group may be replaced by an oxygen atom or a carbonyl group. |
申请公布号 |
JP2014029514(A) |
申请公布日期 |
2014.02.13 |
申请号 |
JP20130135068 |
申请日期 |
2013.06.27 |
申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
ICHIKAWA KOJI;KAMABUCHI AKIRA;SUZUKI YUKI |
分类号 |
G03F7/038;C08F20/38;G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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