METHOD FOR PRODUCING POLYMER COMPOUND, POLYMER COMPOUND, AND PHOTORESIST RESIN COMPOSITION

摘要

Provided are a method for producing a polymer compound that has a very low content of impurities such as metal components and has excellent preservation stability, a polymer compound obtained by this production method, and a photoresist resin composition containing the polymer compound. This method for producing a polymer compound comprises a step for using a filter that contains no strongly acidic cation exchange groups and exhibits a positive zeta potential to filter a resin solution containing a polymer compound having at least one species of monomer unit (a) selected from monomer units represented by formulae (a1) to (a3), and a monomer unit (b) comprising a group that is partially eliminated by acid to become alkali-soluble.