| 摘要 |
PROBLEM TO BE SOLVED: To provide a polymer compound suitable as a base resin in a chemically amplified positive resist material, a positive resist material using the polymer compound, and a patterning process.SOLUTION: A polymer represented by the general formula (1) comprises recurring units XA represented by the general formula, recurring units B1 and/or B2 represented by the general formula having a carboxyl and/or phenolic hydroxyl group whose hydrogen atom is substituted by an acid labile group, and recurring units C1 having a hydroxy-aromatic group and/or recurring units C2 having a 2,2,2-trifluoro-1-hydroxyethyl group. |
