| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing system for properly determining the life of a metal oxide abrasive in comparison with a conventional system in order to effectively utilize the metal oxide abrasive, and to provide an abrasive life determination method.SOLUTION: A peak of a radial distribution of Ce atom on the surface of a ceria abrasive and oxygen adjacent thereto is found by analyzing X-ray absorption properties measured by an electron yield method XAFS measurement section 48, and the life of the ceria abrasive can be determined on the basis of a height h of the peak. Accordingly, the life of the ceria abrasive can more properly be determined, in comparison with a conventional polishing system in which the life of the abrasive is determined from experience using polishing data in the repeated use and a grinding test is performed in each case for confirmation. For example, it can be properly prevented that the ceria abrasive with remaining polishing ability is discarded in a multi-product manufacturing line, or that failures are caused on the polished surface of a substrate 14 to be polished by using the ceria abrasive after the life is over. |
