| 摘要 |
<p>A processing apparatus (EX) projects and exposes a pattern formed in a mask pattern (M) to a substrate (P). The processing apparatus is provided with: a mask holding member (DM) that holds the mask pattern in a bent state; a substrate supporting member (DP) that supports the substrate; a lighting system (IU) that lights a part of the mask pattern; an intermediate image forming optical system (PL1), which forms an intermediate image (IM) corresponding to a lighting region (IR) formed on the mask pattern by means of the lighting system, and which brings the tangential plane (IMa) of the intermediate image and the tangential plane (IRa) of the lighting region on the mask pattern into a conjugate relationship by satisfying shine-proof conditions; and a projection optical system (PL2), which projects the intermediate image to a projection region (PR) on the substrate supported by means of the substrate supporting member.</p> |
