RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with an excellent shape can be produced.SOLUTION: The resist composition comprises a resin having a structural unit expressed by formula (I) and an acid generator expressed by formula (II). In the formulae, ring Trepresents a sultone ring optionally having a substituent; Xrepresents an alkanediyl group; and Xrepresents an oxygen atom or -N(R)-, wherein Rrepresents a hydrogen atom or an alkyl group.