| 摘要 |
PURPOSE: A trapping device for manufacturing a semiconductor is provided to improve trapping performance by processing a byproduct with plasma. CONSTITUTION: A vacuum pump pumps air from a processing chamber. Gas is discharged by the vacuum pump. A plasma trapping unit (20) is arranged between the processing chamber and the vacuum pump. The plasma trapping unit collects the byproduct of the gas. A plasma generating device (25) generates plasma. |
