| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask pattern generation method for efficiently making the coverage of a mask pattern a reference range, a mask pattern generation device, and a mask pattern generation program.SOLUTION: A method for generating a mask pattern of a semiconductor device has a reference step for library information having a plurality of library patterns having a boundary pattern area and a density security area for arranging a dummy pattern, a first arrangement step for arranging a first library pattern, a second arrangement step for arranging a second library pattern without overlapping a density security area of the second library pattern on the boundary pattern area of the first library pattern, and a dummy pattern arrangement step for arranging the dummy pattern in an area outside the boundary pattern areas of the first and second library patterns, and including the density security area. |
