| 摘要 |
PROBLEM TO BE SOLVED: To provide an etching method by which variations in the amount of etching is suppressed.SOLUTION: An etching method includes: an accommodating step of immersing an object 1 having a flat etched surface 1a into an etchant 3 held in a container 2 having a flat bottom surface 2a, and accommodating the object 1 in the container 2 so that the etched surface 1a is parallel to the bottom surface 2a; and an agitating step of agitating the etchant 3 by inclining the container 2 with one point of the bottom surface 2a being a fulcrum 2b and then continuously rotating the container 2 in a circumferential direction centering the fulcrum 2b with the container 2 kept inclined, to such an extent that the object 1 is not exposed from the etchant 3. |
