发明名称 |
High Breakdown Voltage III-Nitride Device |
摘要 |
A semiconductor device includes a semiconductor body having a compound semiconductor material on a substrate. The compound semiconductor material has a channel region. A source region extends to the compound semiconductor material. A drain region also extends to the compound semiconductor material and is spaced apart from the source region by the channel region. An insulating region is buried in the semiconductor body between the compound semiconductor material and the substrate in an active region of the semiconductor device. The active region includes the source, the drain and the channel region of the device. The insulating region is discontinuous over a length of the channel region between the source region and the drain region. |
申请公布号 |
US2014042448(A1) |
申请公布日期 |
2014.02.13 |
申请号 |
US201213584442 |
申请日期 |
2012.08.13 |
申请人 |
OSTERMAIER CLEMENS;PRECHTL GERHARD;HAEBERLEN OLIVER;INFINEON TECHNOLOGIES AUSTRIA AG |
发明人 |
OSTERMAIER CLEMENS;PRECHTL GERHARD;HAEBERLEN OLIVER |
分类号 |
H01L29/778;H01L21/336;H01L29/78 |
主分类号 |
H01L29/778 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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