发明名称 HIGH ELECTRON MOBILITY TRANSISTOR AND METHOD OF FORMING THE SAME
摘要 A high electron mobility transistor (HEMT) includes a first III-V compound layer. A second III-V compound layer is disposed on the first III-V compound layer and is different from the first III-V compound layer in composition. A source feature and a drain feature are in contact with the second III-V compound layer. A n-type doped region underlies each source feature and drain feature in the second III-V compound layer. A p-type doped region underlies each n-type doped region in the first III-V compound layer. A gate electrode is disposed over a portion of the second III-V compound layer between the source feature and the drain feature.
申请公布号 US2014042446(A1) 申请公布日期 2014.02.13
申请号 US201213571169 申请日期 2012.08.09
申请人 CHIANG CHEN-HAO;CHIU HAN-CHIN;LIU PO-CHUN;CHEN CHI-MING;YU CHUNG-YI;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 CHIANG CHEN-HAO;CHIU HAN-CHIN;LIU PO-CHUN;CHEN CHI-MING;YU CHUNG-YI
分类号 H01L29/778;H01L21/335;H01L29/20 主分类号 H01L29/778
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