| 摘要 |
Disclosed is an imprinting system which comprises: a substrate processing station for forming a first resist film on a substrate; a template processing station which comprises a mold release agent processing block for forming a film of a mold release agent on the surface of a template; an imprinting station which is connected to the substrate processing station and the template processing station and provided with a plurality of imprinting units that form a second resist film on the substrate, on which the first resist film has been formed, and transfer the transfer pattern of the template, on which the film of the mold release agent has been formed, to the second resist film, thereby forming a predetermined resist pattern on the second resist film; a substrate carrying in/out station which is connected to the substrate processing station and carries a substrate into or out of the substrate processing station; and a template carrying in/out station which is connected to the template processing station and carries a template into or out of the template processing station. |
