| 摘要 |
The apparatus (10) for treating surfaces (18, 44) by ion bombardment comprises a vacuum chamber (12), in which the surfaces (18, 44) are intended to be placed, and ion bombardment means comprising a first ion gun (20) intended to emit a first ion beam (24). The ion bombardment means furthermore comprise a second ion gun (22) intended to emit a second ion beam (26). In addition, the apparatus (10) comprises a holder (14) intended to bear two opposed surfaces (18, 44) to be treated bounding at least one object (16, 42), and means (30) for positioning the holder (14) between the two ion guns (20, 22) so that each gun (20, 22) emits a beam (24, 26) towards one of the corresponding opposed surfaces (18, 44). The invention also relates to a process for treating surfaces (18, 44) by ion bombardment. |
