Process to synthetize a nanostructured composite material and associated dispositive.

摘要

The method comprises: depositing a matrix for a material on a target surface (15) in a synthesis chamber (3); generating a jet of nanoparticles in a carrier gas with a system with an expansion chamber (1) provided with an orifice output (7) for separating the expansion chamber from the synthesis chamber; and adjusting distance (L) between the outlet of the expansion chamber and the target surface and/or adjusting the gas pressure in the synthesis chamber. The pressure is adjusted in the synthesis chamber by introducing an additional gas or a precursor gas into the synthesis chamber. The method comprises: depositing a matrix for a material on a target surface (15) in a synthesis chamber (3); generating a jet of nanoparticles in a carrier gas with a system with an expansion chamber (1) provided with an orifice output (7) for separating the expansion chamber from the synthesis chamber; and adjusting distance (L) between the outlet of the expansion chamber and the target surface and/or adjusting the gas pressure in the synthesis chamber. The pressure is adjusted in the synthesis chamber by introducing an additional gas or a precursor gas into the synthesis chamber, where the additional gas includes neutral gas or a mixture of neutral gases. The pressure in the synthesis chamber is adjusted to 0.1-1 Pa. The deposition process is performed by sputtering, physical vapor deposition, chemical vapor deposition or optionally plasma assisted process. The target surface is heated. The nanoparticles and the matrix on the target surface are deposited simultaneously or sequentially. The distance between the outlet of the expansion chamber and the target surface is adjusted by specific relation as given in the specification, where the distance between the outlet of the expansion chamber and the target surface is adjusted to less than 1.5. An independent claim is included for a device for synthesizing a nanostructured composite material.