| 摘要 |
<p>The present invention relates to the accurate maintenance of the leveling of a mask and a wafer all the time by remarkably improving the leveling performance of a wafer stage which is a key component of a mask aligner used for a semiconductor manufacturing process. For technical characteristics of the present invention, a stage leveling device: can perform leveling while freely moving a wafer stage up and down using multiple leveling air shovers with excellent flexibility; can improve the centering performance while performing one-point support on the central point of the wafer stage using a centering module; and can realize mutually integrated motions between the wafer stage and a leveling rod while multiple magnetic holders, which are attached to the bottom of the wafer stage, closely adhere to the leveling rod.</p> |
