发明名称 Device having reduced bias temperature instability (bti)
摘要 A semiconductor device (100) is disclosed along with methods (10) for manufacturing such a device. In certain embodiments, the semiconductor device includes a source electrode (124) formed using a metal that limits a shift, such as due to bias temperature instability, in a threshold voltage of the semiconductor device during operation. In certain embodiments the semiconductor device may be based on silicon carbide.
申请公布号 EP2696366(A2) 申请公布日期 2014.02.12
申请号 EP20130179428 申请日期 2013.08.06
申请人 GENERAL ELECTRIC COMPANY 发明人 MICHAEL, JOSEPH DARRYL;ARTHUR, STEPHEN DALEY;JOHNSON, TAMMY LYNN;LILIENFELD, DAVID ALAN
分类号 H01L21/04;H01L29/66;H01L29/78 主分类号 H01L21/04
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