摘要 |
A novel antireflective coating composition is provided, said antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, (c) at least one polymer, wherein U1 and U2 are independently a C1-C10 alkylene group; V is selected from a C1-C10 alkylene, arylene and aromatic alkylene; W is selected from H, C1-C10 alkyl, aryl, alkylaryl and V-OH; Y is selected from H, W, and U3C(O)OW, wherein U3 is independently a C1-C10 alkylene group, and m is 1 to 10. Also provided are methods using said compositions as antireflective coatings for substrates in lithographic processes. |
申请人 |
AZ ELECTRONIC MATERIALS USA CORP. |
发明人 |
YAO, HUIRONG;LIN, GUANYANG;SHAN, JIANHUI;CHO, JOON, YEON;MULLEN, SALEM, K. |