| 摘要 |
The present invention relates to an apparatus for trapping a semiconductor residual product. The apparatus for trapping a semiconductor residual product includes a housing having a combination hole and an inlet for exhaust gas, a lower supporter combined with the combination hole of the housing, a trap part for collecting powder by using collision of the exhaust gas, and a flow part. The housing is hollow. The inlet for exhaust gas is formed in the upper part of the housing. The combination hole is formed in the lower part of the housing. The trap part for collecting powder is combined with the upper part of the lower supporter and located in the housing. The flow part is located in the upper part of the trap part. |
