| 发明名称 |
Member with a cleaning surface and a method of removing contamination |
| 摘要 |
A member with a cleaning surface for use in capturing particles in a lithographic apparatus is disclosed. The particles are captured by a plurality of projections which are arranged in a pattern. A sensor can be used to detect contaminant particles in the pattern. |
| 申请公布号 |
US8648997(B2) |
申请公布日期 |
2014.02.11 |
| 申请号 |
US20090629691 |
申请日期 |
2009.12.02 |
| 申请人 |
VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS;BOEREMA MARK DREWES;RUHM MATTHIAS;PUTZ MARIO;ASML NETHERLANDS B.V. |
发明人 |
VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS;BOEREMA MARK DREWES;RUHM MATTHIAS;PUTZ MARIO |
| 分类号 |
G03B27/52;G03B27/58;G03F7/20 |
主分类号 |
G03B27/52 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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