发明名称 |
Photoactive compound gradient photoresist |
摘要 |
A system and method for forming photoresists over semiconductor substrates is provided. An embodiment comprises a photoresist with a concentration gradient. The concentration gradient may be formed by using a series of dry film photoresists, wherein each separate dry film photoresist has a different concentration. The separate dry film photoresists may be formed separately and then placed onto the semiconductor substrate before being patterned. Once patterned, openings through the photoresist may have a tapered sidewall, allowing for a better coverage of the seed layer and a more uniform process to form conductive materials through the photoresist. |
申请公布号 |
US8647796(B2) |
申请公布日期 |
2014.02.11 |
申请号 |
US201113192113 |
申请日期 |
2011.07.27 |
申请人 |
YU CHEN-HUA;LIU CHUNG-SHI;KUO HUNG-JUI;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
YU CHEN-HUA;LIU CHUNG-SHI;KUO HUNG-JUI |
分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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