| 发明名称 |
Cleaning substrate and cleaning method |
| 摘要 |
A cleaning substrate that can prevent a decrease in the operating rate of a substrate processing apparatus. The cleaning substrate that cleans the interior of a chamber in the substrate processing apparatus has a removal mechanism that removes foreign matter in the chamber. |
| 申请公布号 |
US8647442(B2) |
申请公布日期 |
2014.02.11 |
| 申请号 |
US201213454695 |
申请日期 |
2012.04.24 |
| 申请人 |
YAMAZAWA YOHEI;NAGAIKE HIROSHI;SAITO MASASHI;HONDA MASANOBU;TOKYO ELECTRON LIMITED |
发明人 |
YAMAZAWA YOHEI;NAGAIKE HIROSHI;SAITO MASASHI;HONDA MASANOBU |
| 分类号 |
B08B9/08;B08B1/00 |
主分类号 |
B08B9/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
