发明名称 |
Alignment of light source focus |
摘要 |
An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam. |
申请公布号 |
US8648999(B2) |
申请公布日期 |
2014.02.11 |
申请号 |
US20100841728 |
申请日期 |
2010.07.22 |
申请人 |
GRAHAM MATTHEW R.;PARTLO WILLIAM N.;CHANG STEVEN;BERGSTEDT ROBERT A.;CYMER, LLC |
发明人 |
GRAHAM MATTHEW R.;PARTLO WILLIAM N.;CHANG STEVEN;BERGSTEDT ROBERT A. |
分类号 |
G01J3/00 |
主分类号 |
G01J3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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