| 摘要 |
An apparatus for heating a substrate is provided to facilitate maintenance task of a heating portion by sliding the heating portion to one side of a base portion. A substrate is vacuously absorbed with a heating portion(110) and is heated. A base portion(120) is equipped in the lower part of the heating part and supports the heating part. A sliding portion(130) is equipped between the heating part and the base portion and slides the heating part to one side of the base portion. A fixing portion(140) is equipped in the lower surface of the heating part and slides the heating part. The fixing portion fixes the heating portion on the base portion or unfixes the base portion and the heating portion. |
