发明名称 |
Inline process control structures |
摘要 |
A method for process control is disclosed. The method includes performing an etching process on a semiconductor substrate forming a structure and a test structure having a pattern and a releasing mechanism coupled to the pattern; and monitoring the pattern of the test structure to determine whether the etching process is complete. |
申请公布号 |
US8647892(B2) |
申请公布日期 |
2014.02.11 |
申请号 |
US20100907620 |
申请日期 |
2010.10.19 |
申请人 |
LIANG KAI-CHIH;TAI WEN-CHUAN;CHENG CHUN-REN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
LIANG KAI-CHIH;TAI WEN-CHUAN;CHENG CHUN-REN |
分类号 |
H01L23/58;H01L21/66 |
主分类号 |
H01L23/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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