发明名称 FABRICATING METHOD FOR SUBSTRATE
摘要 The present invention relates to a method for fabricating a substrate. According to one embodiment of the present invention, the method for fabricating a substrate includes a step of manufacturing a master mold where an insulating layer formed on one surface of a master substrate and a master electrode layer are formed, a step of forming an electrode layer on the master electrode layer, a step of forming a resin layer surrounding an electrode in the upper part of the insulating layer and the electrode layer, a step of hardening a resin layer by radiation irradiation after a base member is formed on the resin layer, and a step of forming a substrate where the electrode layer is buried in a first resin layer by separating the resin layer from the masker mold. [Reference numerals] (AA) Surface treatment; (BB) Radiation irradiation
申请公布号 KR101361171(B1) 申请公布日期 2014.02.10
申请号 KR20120123376 申请日期 2012.11.02
申请人 NNP CO., LTD. 发明人 HWANG, CHOON SEOB;PARK, DONG SIK
分类号 H01L21/60;G02F1/1335;H05K3/10 主分类号 H01L21/60
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