| 摘要 |
Provided are a method and a device for manufacturing a photo-chemical vapor deposition (CVD) film capable of easily improving uniformity of a film thickness. The method for manufacturing a photo-CVD film comprises the processes of (a) introducing raw material gas of a photo-CVD film into a reaction chamber for depositing the photo-CVD film and applying the predetermined pressure in the reaction chamber; (b) after the (a) process, stopping introducing/emitting the raw material gas into/from the reaction chamber and irradiating light to the reaction chamber; (c) after the (b) process, stopping irradiating, ventilating the reaction chamber and repeating the (a) to (c) processes in several times. [Reference numerals] (AA) Gas pressure; (BB) Gas introduction valve; (CC) Gas emission valve; (DD) Light irradiation; (EE) Treatment time |
