EDGE RING ASSEMBLY FOR PLASMA PROCESSING CHAMBER AND METHOD OF MANUFACTURE THEREOF

摘要

A two piece edge ring assembly is configured to surround a semiconductor substrate in a plasma processing chamber wherein plasma is generated and used to process the semiconductor substrate. The edge ring assembly comprises upper and lower rings which have an outer protective coating. The upper and lower rings are configured such that the upper ring is supported on an outer portion of the upper surface of the lower ring and the protective coatings are on plasma exposed surfaces of the upper and lower rings.