| 摘要 |
PURPOSE: An apparatus for processing a large area substrate is provided to improve process uniformity by using a through hole formed on a gas injection connection part. CONSTITUTION: A substrate mounting part is installed in a reaction chamber. A shower head(30) is installed at the upper part of the substrate mounting part. The shower head includes a gas supply hole for supplying reaction gas to a diffusion space. A gas box(40) is arranged in the upper part of the shower head. A gas injection connection part(60) is installed between the shower head and the gas box. |
